Semiconductor Engineering

Process Variation Analysis Of Device Performance Using Virtual Fabrication — Methodology Demonstrated On A CMOS 14-nm FinFET Vehicle

A new methodology to assess the impact of fabrication inherent process variability on 14-nm fin field effect transistor (FinFET) device performance. August 18th, 2021 - By: Coventor A new methodology ...
Semiconductor Engineering

Process Variation In The Era Of Scaling: Improving Uniformity With Dummy Fill

As semiconductor patterning continues to scale, even small layout nonuniformities can lead to noticeably different process outcomes. Real chip layouts contain a mix of dense regions, large open ...